INTENSE ELECTRON BEAM ENERGY DEPOSITION IN THIN FOIL TARGETS

HONG RUNSHENG FENG QI SU BAORUNG Institute of Atomic Energy, P. O. Box 275, Beijing

doi:10.7538/yzk.1986.20.03.0257

HONG RUNSHENG FENG QI SU BAORUNG Institute of Atomic Energy, P. O. Box 275, Beijing. INTENSE ELECTRON BEAM ENERGY DEPOSITION IN THIN FOIL TARGETS[J]. Atomic Energy Science and Technology, 1986, 20(3): 257-257. DOI: 10.7538/yzk.1986.20.03.0257

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INTENSE ELECTRON BEAM ENERGY DEPOSITION IN THIN FOIL TARGETS

HONG RUNSHENG FENG QI SU BAORUNG Institute of Atomic Energy, P. O. Box 275, Beijing

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Energy deposition of intense electron beam in various thin foil targets hasbeen deduced from the measurement of blow--off ions. The ion energy is deter--mined by the time--of--flight technique combining with the retarding voltagemeasurement. The results show that the energy deposition is in agreement withthe classical deposition for high Z targets while it is somewhat higher than theclassical one for low Z targets.

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INTENSE ELECTRON BEAM ENERGY DEPOSITION IN THIN FOIL TARGETS

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