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HUANG NINGKANG FENG ZHIRONG WANG DEZHI (Institute of Nuclear Science and Technology, Sichuan University, Chengdu, 610064). EFFECTS OF THE ARGON ION IRRADIATION ON THE MICROSTRUCTURE OF ZrO_2-Y_2O_3 FILMS[J]. Atomic Energy Science and Technology, 1992, 26(6): 30-30. DOI: 10.7538/yzk.1992.26.06.0030
Citation: HUANG NINGKANG FENG ZHIRONG WANG DEZHI (Institute of Nuclear Science and Technology, Sichuan University, Chengdu, 610064). EFFECTS OF THE ARGON ION IRRADIATION ON THE MICROSTRUCTURE OF ZrO_2-Y_2O_3 FILMS[J]. Atomic Energy Science and Technology, 1992, 26(6): 30-30. DOI: 10.7538/yzk.1992.26.06.0030
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EFFECTS OF THE ARGON ION IRRADIATION ON THE MICROSTRUCTURE OF ZrO_2-Y_2O_3 FILMS

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  • The microstructure of the films deposited ZrO_2-Y_2O_3 by Ar~+ ion irradiation are investigated with XRD、AES and XPS. The results show that amorphous films deposited with r.f. magnetron sputtering at room temperature are transformed partly to crystalline after argon ion irradiation. The irradiated films are obviously mixed with substrate and contaminating carbon enteres the films deeply. Besides, Zr(3d), Y(3d) and O(1s) on the surface of the deposited films are studied before and after argon ion irradiation.
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