YAO Shu de 1,2, MENG Zhao xiang 1, YU Peng peng 1, ZHANG Yong 1, ZHOU Sheng qiang 1, LU Yi hong 1, ZHANG Guo yi 3, TONG Yu zhen 3 (1 Department of Technical Physics, Peking University, Beijing 100871, China; 2 Institutej of Heavy Ion physics, Peking University, Beijing 100. Analysis and Modification of New Photoelectricity Material GaN by Ion Beam[J]. Atomic Energy Science and Technology, 2000, 34(S1): 41-41. DOI: 10.7538/yzk.2000.34.S1.0041
Citation: YAO Shu de 1,2, MENG Zhao xiang 1, YU Peng peng 1, ZHANG Yong 1, ZHOU Sheng qiang 1, LU Yi hong 1, ZHANG Guo yi 3, TONG Yu zhen 3 (1 Department of Technical Physics, Peking University, Beijing 100871, China; 2 Institutej of Heavy Ion physics, Peking University, Beijing 100. Analysis and Modification of New Photoelectricity Material GaN by Ion Beam[J]. Atomic Energy Science and Technology, 2000, 34(S1): 41-41. DOI: 10.7538/yzk.2000.34.S1.0041
  • Study the new photoelectricity material GaN based by ion beam is very important and necessary. The structure and crystal quality of GaN are measured and analyzed using Rutherford backscattering spectrometry and channeling. The resistivity of GaN has been changed to very higher by implantation H + ion.
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