Advanced Search
ZHOU Bin 1, WANG Jue 1, HAN Ming 2, XU Ping 1, SHEN Jun 1, DENG Zhong-sheng 1,_WU Guang-ming 1, ZHANG Qin-yuan 1,CHEN Ling-yan 1, WANG Yue-lin 2__(1. Pohl Institute of Solid State Physics, Tongji University, Shanghai 200092, China;_2. State Key Laboratory of Transducer Technology, Shanghai. The Thin Silicon Foil and Silicon Grating Foil-Used in Laser Imprint Research[J]. Atomic Energy Science and Technology, 2001, 35(4): 300-300. DOI: 10.7538/yzk.2001.35.04.0300
Citation: ZHOU Bin 1, WANG Jue 1, HAN Ming 2, XU Ping 1, SHEN Jun 1, DENG Zhong-sheng 1,_WU Guang-ming 1, ZHANG Qin-yuan 1,CHEN Ling-yan 1, WANG Yue-lin 2__(1. Pohl Institute of Solid State Physics, Tongji University, Shanghai 200092, China;_2. State Key Laboratory of Transducer Technology, Shanghai. The Thin Silicon Foil and Silicon Grating Foil-Used in Laser Imprint Research[J]. Atomic Energy Science and Technology, 2001, 35(4): 300-300. DOI: 10.7538/yzk.2001.35.04.0300
shu
    Graphical Abstract
    • Abstract
  • The research of laser imprint is an important experiment in inertial confinement fusion(LCF). Thin silicon foil with a thickness of 3～4 μm and surface roughness about 10 nm is prepared by oxidation, diffusion, photoetching process and self-stop etching process. Combined with ion beam etching process, the silicon grating foil with chess board and strip pattern is prepared on the silicon foil. The parameters of diffusion, oxidation, etching process are studied to control the roughness of thin silicon foil. And the parameters of ion beam etching process are studied to control the pattern precision of silicon grating foil._
    • FullText(HTML)
  • loading
    • References (3)
    • Related Articles

Catalog

    Turn off MathJax
    Article Contents

    /

    DownLoad:  Full-Size Img  PowerPoint
    Return
    Return