Analysis of Ti/Mo Film by X-ray Photoelectron Spectroscopy

Chemical elements and their electronic binding energy on surface of Ti film and bulk are analyzed by X ray photoelectron spectroscopy(XPS) and Ar + etching. The results show that the surface of specimens is contaminated by carbon and oxygen. Mo on surface of Ti film is from substrate. The XPS spectra of Ti 2p of the etched specimens are fitted on.The results show that Ti chemical states on surface of Ti film are TiO 2 with a content of approaching to 100% and a little Ti. Some TiO 2 will be reduced to low chemical states with the increasing of etching time. The chemical states of Mo on surface of Ti film are MoO 3 and Mo. The content of Mo increases as etching time increasing. Chemical state of carbon on the surface of film is graphite and carbide with binding energy of 288.2～288.9 eV.