Microstructure Analysis of Helium Implantation on Nanometer Titanium Film at Room Temperature

The nanometer titanium film implanted by helium is studied using a dose of 0.1, 0.3 and 0.2 with the energy of 200 and 100 keV at room temperature. The surface morphology and microstructure of the samples are determined by the advanced surface analysis technique. It is found that the surface morphology of atomic force microscope (AFM) micrograph shows crystal grain with extremely non homogeneity from several ten nanometers to two hundred nanometers before implantation, but the crystal grain of all three samples is grown after implantation, moreover, increases obviously with increasing implantation dose and large substructure grain appears in the grown grain. As a result, it indicates an important phenomenon that the grown grain might be crashed to smaller grain again during He + implantation with high dose. The average grain of the film is 136 nm calculated from the sharp peak of X ray diffraction under an angle of 2 θ =15°～40° after implantation. It is shown that the nanometer grain of the film is further increased, and it is in good agreement with that of AFM B micrograph in nm region.