Study on Properties of U Films Prepared by Magnetron Sputtering

Surface morphology and microstructure of U films prepared by magnetron sputtering deposition are investigated with X ray photoelectron spectroscopy(XPS) and scanning transmission electron microscopy(STEM). Density and surface coarse of U films have been measured by displacement method and Houmeier(HME) instrument. The results indicate that U films prepared by magnetron sputtering deposition are partial in an oxidized states, the metallic nature of the films is reflected in a U4f spectrum. Microstructure of U films is composed of dense micro crystal islands or amorphous layer. Density and surface coarse of U films are about 14 g/cm 3 and 0.2 μm, respectively.