LU Xue-chao,WANG Xiao-lin,XIAN Xiao-bin,LANG Ding-mu,DONG Ping(China Academy of Engineering Physics, P. O. Box 919-71, Mianyang 621900, China). Influence of Bias Voltages on Microstructures and Residual Stress of Aluminum Coatings on Uranium Substrate[J]. Atomic Energy Science and Technology, 2003, 37(S1): 121-121. DOI: 10.7538/yzk.2003.37.S1.0121
Citation: LU Xue-chao,WANG Xiao-lin,XIAN Xiao-bin,LANG Ding-mu,DONG Ping(China Academy of Engineering Physics, P. O. Box 919-71, Mianyang 621900, China). Influence of Bias Voltages on Microstructures and Residual Stress of Aluminum Coatings on Uranium Substrate[J]. Atomic Energy Science and Technology, 2003, 37(S1): 121-121. DOI: 10.7538/yzk.2003.37.S1.0121

Influence of Bias Voltages on Microstructures and Residual Stress of Aluminum Coatings on Uranium Substrate

  • Influence of different bias voltages on microstructures and residual stress of aluminum coatings is investigated by scanning electron microscope (SEM), X-ray diffraction (XRD) and X-ray stress analyzer, respectively. The result shows that the microstructures are influenced strongly by bias voltages, of which are worst at - 300 V and at low bias voltages are better than at 0 V. The preferential orientation of crystal planes shift from (111) to (200) above -200 V. The residual stress of all coatings is small, which has a change from tensile to compressive stress with the increase of bias voltages.
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