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LI Chang-ming, CHEN Zhi-mei, WU Wei-dong, TANG Yong-jian (Research Center of Laser Fusion, China Academy of Engineering Physics, Mianyang 621900, China). Preparation of the CHN Film[J]. Atomic Energy Science and Technology, 2005, 39(2): 176-176. DOI: 10.7538/yzk.2005.39.02.0176
Citation: LI Chang-ming, CHEN Zhi-mei, WU Wei-dong, TANG Yong-jian (Research Center of Laser Fusion, China Academy of Engineering Physics, Mianyang 621900, China). Preparation of the CHN Film[J]. Atomic Energy Science and Technology, 2005, 39(2): 176-176. DOI: 10.7538/yzk.2005.39.02.0176
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  • In the paper, the principle of hollow cathode plasma chemical vapor deposition(HPCVD) is expounded briefly. The CHN films have been produced on quartz substrate using hollow cathode plasma CVD method with CH_(4) and NH_(3)/H_(2) source. The surface configuration and the distribution of component were measured and analysed by AFM and XPS. And the aggradation velocity was also obtained under some conditions.
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