Construction of Tandem-mplanter-TEM Interface System

The first tandemimplanterTEM interface system in China, consisting of a 2×1.7 MV tandem accelerator, a 200 kV ion implanter, a H800 transmission electron microscope(TEM) and the beam transport system, was established recently. Improvements on the component facilities were made, and effective steps were taken to minimize mechanical vibration transmission from the ion beam line to the TEM. No obvious wobbling of the TEM image was observed, showing that the TEM works normally while the tandem and the implanter as well as the vacuum pumps are in operation. Under the tilting angle of up to 52° of the sample relative to the ion beam, the TEM observation was not affected by the ion implantation, meaning that in situ and real time study on the implantation could be carried out. For 115 keV nitrogen ion beam output from the implanter, the current measured at the entrance of the TEM is 100-180 nA. The amorphization