Influence of Sample Position on External Beam PIXE Analysis
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Graphical Abstract
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Abstract
The influence of sample position on the determinations of Ar, Si, Ca and Fe in external beam PIXE analysis was studied by changing the sample position and angle between sample and external beam line. The results indicate that a position displacement of ±0.14 mm, or an angle change of ±1°, can each introduce a relative uncertainty of 5%.
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