Properties of Ti and Ti-Alloy Film Deposited by Direct Current Magnetron Sputtering

Ti and Ti-alloy films were deposited on Si (100) and Mo substrate by direct current(DC) magnetron sputtering method. The influences of substrate temperature and others on the film properties were discussed. The composition properties of the films were studied by XPS technique. The structures of the films were obtained using XRD and SEM techniques, and the growth model was also investigated. It is found that the grain size of the Ti-alloy films is smaller than that of pure Ti films; with increase in temperature, the grain size and adhesion of films are both increased; the composition of the films is uniform from the target.