XU Hua, WU Wei-dong, HE Zhi-bing, YUAN Guang-hui, CHEN Zhi-mei. Fabrication Technique of Au/Gd Hohlraum by Magnetron Sputtering[J]. Atomic Energy Science and Technology, 2008, 42(10): 948-952. DOI: 10.7538/yzk.2008.42.10.0948
Citation: XU Hua, WU Wei-dong, HE Zhi-bing, YUAN Guang-hui, CHEN Zhi-mei. Fabrication Technique of Au/Gd Hohlraum by Magnetron Sputtering[J]. Atomic Energy Science and Technology, 2008, 42(10): 948-952. DOI: 10.7538/yzk.2008.42.10.0948

Fabrication Technique of Au/Gd Hohlraum by Magnetron Sputtering

  • The Au/Gd multilayer films were prepared by magnetron sputtering. The effects of the technique parameters on the structure and properties of Au/Gd multilayer films were studied. The results show that the deposition rates of Au and Gd films decrease with increase of the sputtering pressure. At low pressure, the RMS roughnesses of Au and Gd films decrease with decrease of the sputtering pressure. The period structures of Au/Gd multilayer films are clearer at lower sputtering power. Based on the preparations of Au/Gd multilayer films, the Au/Gd hohlraum were fabricated. The effects of Au/Gd ratio on the mechanical properties of the Au/Gd hohlraum were investigated.
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