Preparation of Continuous Gold Nano-films by Magnetron Sputtering

Gold nanometer films were deposited on Si substrates at different condition by magnetron sputtering. Influences of the sputtering power on film growing rate, surface roughness, microstrcture were investigated. The influences were neglectable for sputtering power below 200 W. Film growing rate under 20 W was accurately calibrated, and the evolution process of gold film was observed. It shows that the growing model of gold film on Si substrates is Volver-Weber growth. Films become continuous when thickness reaches 8 nm. At growing early stage of gold film, relationship between grain size and film thickness is linear. Speed of grain growth become slow until stagnation. Grain growth is replaced by new nucleation when grain sizes reach 70 nm.