CHEN Qiu-yun, LAI Xin-chun, BAI Bin, ZHANG Gui-kai, LUO Li-zhu, JIANG Chun-li. Preparation and Measurement of Optical Constants and Thickness for Uranium Dioxide Thin Films by Reflectance Spectroscopy[J]. Atomic Energy Science and Technology, 2010, 44(9): 1126-1130. DOI: 10.7538/yzk.2010.44.09.1126
Citation: CHEN Qiu-yun, LAI Xin-chun, BAI Bin, ZHANG Gui-kai, LUO Li-zhu, JIANG Chun-li. Preparation and Measurement of Optical Constants and Thickness for Uranium Dioxide Thin Films by Reflectance Spectroscopy[J]. Atomic Energy Science and Technology, 2010, 44(9): 1126-1130. DOI: 10.7538/yzk.2010.44.09.1126

Preparation and Measurement of Optical Constants and Thickness for Uranium Dioxide Thin Films by Reflectance Spectroscopy

  • Uranium dioxide thin films were prepared by magnetron sputtering method. The films were analyzed and characterized by SEM, XPS and XRD. The reflectances of the films between 400 and 1 200 nm wavelength were measured by reflectance spectroscopy. By fitting the reflectance, the value of refractive index n and extinction coefficient k between 450 and 950 nm wavelength and the films thickness were obtained, the n is in the range of 2.1-2.65, k is nearly 0.51, and the film thickness is 637 nm.
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