Preparation and Measurement of Optical Constants and Thickness for Uranium Dioxide Thin Films by Reflectance Spectroscopy
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Graphical Abstract
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Abstract
Uranium dioxide thin films were prepared by magnetron sputtering method. The films were analyzed and characterized by SEM, XPS and XRD. The reflectances of the films between 400 and 1 200 nm wavelength were measured by reflectance spectroscopy. By fitting the reflectance, the value of refractive index n and extinction coefficient k between 450 and 950 nm wavelength and the films thickness were obtained, the n is in the range of 2.1-2.65, k is nearly 0.51, and the film thickness is 637 nm.
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