FEI Wu-xiong, LU Wu, REN Di-yuan, ZHENG Yu-zhan, WANG Yi-yuan, CHEN Rui, LI Mao-shun, LAN Bo, CUI Jiang-wei, ZHAO Yun, WANG Zhi-kuan, YANG Yong-hui. Application of Accelerated Simulation Method on NPN Bipolar Transistors of Different Technology[J]. Atomic Energy Science and Technology, 2010, 44(12): 1493-1497. DOI: 10.7538/yzk.2010.44.12.1493
Citation: FEI Wu-xiong, LU Wu, REN Di-yuan, ZHENG Yu-zhan, WANG Yi-yuan, CHEN Rui, LI Mao-shun, LAN Bo, CUI Jiang-wei, ZHAO Yun, WANG Zhi-kuan, YANG Yong-hui. Application of Accelerated Simulation Method on NPN Bipolar Transistors of Different Technology[J]. Atomic Energy Science and Technology, 2010, 44(12): 1493-1497. DOI: 10.7538/yzk.2010.44.12.1493

Application of Accelerated Simulation Method on NPN Bipolar Transistors of Different Technology

  • With different radiation methods,ionizing radiation response of NPN bipolar transistors of six different processes was investigated. The results show that the enhanced low dose rate sensitivity obviously exists in NPN bipolar transistors of the six kinds of processes. According to the experiment, the damage of decreasing temperature in step during irradiation is obviously greater than the result of irradiated at high dose rate. This irradiation method can perfectly simulate and conservatively evaluate low dose rate damage, which is of great significance to radiation effects research of bipolar devices. Finally, the mechanisms of the experimental phenomena were analyzed.
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