BIN Ren, LIU Ke-zhao, CHEN Lin, BAI Bin, ZHONG Yong-qiang. Hydriding Behavior of Glow-Discharge Plasma Nitrided Uranium Surface[J]. Atomic Energy Science and Technology, 2012, 46(7): 775-779. DOI: 10.7538/yzk.2012.46.07.0775
Citation: BIN Ren, LIU Ke-zhao, CHEN Lin, BAI Bin, ZHONG Yong-qiang. Hydriding Behavior of Glow-Discharge Plasma Nitrided Uranium Surface[J]. Atomic Energy Science and Technology, 2012, 46(7): 775-779. DOI: 10.7538/yzk.2012.46.07.0775

Hydriding Behavior of Glow-Discharge Plasma Nitrided Uranium Surface

  • Surface nitrided uranium was prepared using glow-discharge plasma nitriding method. The surface layer was examined and a comparison between surface nitrided and oxidized against hydrogen corrosion was monitored with a digital microscope. AES depth profile and XRD spectrum show that the surface-nitrided layer is about 250 nm in sputtering depth and mainly consists of α-U2N3+x, with a mild nitride-substrate interface and nitrogen diffuses into the metal bulk. SEM micrographs show that pulsed glow-discharge plasma nitriding can reduce the number of polishing scratches and other defects. Surface nitride layer retards hydrogen diffusion into bulk, delays the nucleation and restrains hydride growth. Glow-discharge plasma nitriding can passivate uranium surface against hydrogen corrosion effectively.
  • loading

Catalog

    Turn off MathJax
    Article Contents

    /

    DownLoad:  Full-Size Img  PowerPoint
    Return
    Return