Preparation of φ33 mm Simulative Source of Nickel With Pulse-Plating Technology

The DC constant current power with a magnitude of milliampere has one defect of lower protect voltage. This brought itself not suitable for the preparation of large area and high radioactivity ⁶³Ni. Based on a positive pulse power, the effects from some experiment conditions on the plating results in the simple plating solution were studied. The result shows that 95% of ⁵⁸Ni deposition rate is gained under the condition of cathode current density of 18 mA/cm², room temperature, pulse width of 80%, frequency of 5 kHz and plating time of 2.5 h.