FANG Chao. Diffusion and Release of Noble Gas and Halogen Fission Products With Several Days Half-Life in UO2 Particle[J]. Atomic Energy Science and Technology, 2013, 47(1): 109-113. DOI: 10.7538/yzk.2013.47.01.0109
Citation: FANG Chao. Diffusion and Release of Noble Gas and Halogen Fission Products With Several Days Half-Life in UO2 Particle[J]. Atomic Energy Science and Technology, 2013, 47(1): 109-113. DOI: 10.7538/yzk.2013.47.01.0109

Diffusion and Release of Noble Gas and Halogen Fission Products With Several Days Half-Life in UO2 Particle

  • The exact solutions of diffusion and release model of noble gas and halogen fission products in UO2 particle of HTGR were built under the conditions of adsorption effect and other physical processes. The corresponding release fractions (F(t)) and the ratio of release and productive amounts (R(t)/B(t)) of fission products were also derived. Furthermore, the F(t) and R(t)/B(t) of 131I, 131Xem, 133Xe and 133Xem whose half-lifes are several days in UO2 particle with the exact solutions, approximate solutions and corresponding numerical solutions under different temperature histories of reactor core were investigated. The results show that the F(t) and R(t)/B(t) are different in numerical values unless the time of release is long enough. The properties of conservation of exact solutions are much more reasonable than the ones of approximate solutions. It is also found that the results of exact solutions approach the actual working conditions more than the approximate and numerical solutions.
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