Influence of Ni Doping on Anti-poison Properties of Vanadium

The VNi_0.01 alloy was fabricated by induction melting. The VNi_0.01 alloy and pure vanadium were poisoned by 0.5%CO₂ in deuterium (1.0 MPa) after activation. The deuterium absorption rate of VNi_0.01 alloy was faster than that of pure vanadium in the early stage, though it rapidly decreased to zero. After removing the gas by heating and vacuumizing, the pure deuterium was resent to sample chamber with final pressure at 1.0 MPa. The ability of deuterium absorption of VNi_0.01 alloy was regenerated as it was fully activated, but the absorption rate of pure vanadium was lower than it was first activated. Besides, the pressure boost property of VNi_0.01 alloy was superior to pure vanadium in the temperature range of 300-400 K. It is expected that VNi_0.01 alloy could be used in pressure boost chemical bed. The results of these studies will provide a direct basis for application of the material.