HU Rui, LIU Yun-tao, WANG Wei, LIU Zhong-xiao, LI Jun-hong, GAO Jian-bo, WANG Hong-li, CHEN Dong-feng. Design, Simulation and Test for Double Focusing Si Monochromator of Neutron Residual Stress Diffractometer[J]. Atomic Energy Science and Technology, 2015, 49(7): 1315-1319. DOI: 10.7538/yzk.2015.49.07.1315
Citation: HU Rui, LIU Yun-tao, WANG Wei, LIU Zhong-xiao, LI Jun-hong, GAO Jian-bo, WANG Hong-li, CHEN Dong-feng. Design, Simulation and Test for Double Focusing Si Monochromator of Neutron Residual Stress Diffractometer[J]. Atomic Energy Science and Technology, 2015, 49(7): 1315-1319. DOI: 10.7538/yzk.2015.49.07.1315

Design, Simulation and Test for Double Focusing Si Monochromator of Neutron Residual Stress Diffractometer

  • The double focusing Si monochromator was designed, simulated and tested for the neutron residual stress diffractometer on China Advanced Research Reactor. The optimal vertical curvature and the optimal thickness of Si wafers were obtained by SIMRES simulation program. In addition, the figure of merit in dependence on the scattering angle, monochromator horizontal curvature and wavelength was also determined by this program. The neutron beam test results indicate that the intensity of neutron increases by 15 times by using double focusing Si monochromator in comparison with Cu monochromator.
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