CAO Dianpeng, ZOU Shuliang, XIAO Weiwei, TANG Dewen, LEI Ming. Influence of Pretreatment and Sputtering Parameter on Film/Base Bond Strength of TiN Coating on Zirconium Alloy Surface[J]. Atomic Energy Science and Technology, 2018, 52(11): 2095-2101. DOI: 10.7538/yzk.2018.youxian.0446
Citation: CAO Dianpeng, ZOU Shuliang, XIAO Weiwei, TANG Dewen, LEI Ming. Influence of Pretreatment and Sputtering Parameter on Film/Base Bond Strength of TiN Coating on Zirconium Alloy Surface[J]. Atomic Energy Science and Technology, 2018, 52(11): 2095-2101. DOI: 10.7538/yzk.2018.youxian.0446

Influence of Pretreatment and Sputtering Parameter on Film/Base Bond Strength of TiN Coating on Zirconium Alloy Surface

  • In order to obtain the preparation technology of high bond strength zirconium alloy surface coating, the influence of surface roughness, sputtering power, substrate temperature and bias on the film/base bond strength of TiN coating on the surface of zirconium alloy was investigated by magnetron sputtering to prepare TiN coating and by scratch method to test the film/base bond strength. It is found that when the thickness of the TiN coating is within the range of 5-15 μm and the surface roughness is (0.20±0.03) μm, the sputtering power is 500 W, and the substrate temperature is 300 ℃, the coating has the better bond strength. While the coating prepared by substrate bias of -100 V has the best bond strength among the four kinds of substrate biases discussed. The results show that the sputtering process parameters have a significant influence on the film/base bond strength of the coating. Among those parameters, substrate temperature has the most significant effect, the second is the substrate bias, the third is the sputtering power, and the minimum is the surface roughness of the substrate.
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