平面工艺硅探测器的温度性能研究

TEMPERATURE PROPERTIES STUDY OF THE PLANAR PROCESS Si DETECTOR

  • 摘要: 平面工艺硅探测器有可能成为适合实际应用的X射线探测器。文章介绍了实验装置,系统地测量了-20℃到+50℃温度范围内探测器的温度性能,并对结果进行了初步的分析。

     

    Abstract: The planar process Si detector is a kind of new type charged particles detector with fineproperties, it is possibly made X-ray detector suitable to the practical applications. In order to re-search into this possibility, detector temperature properties must be studied. In the paper experi-ment apparatus is introduced, temperature properties of the planar process Si detector are moresystematically measured, the temperature range is from -20℃ to +50℃. The results are pre-liminarily analyzed.

     

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