8.0nm X射线激光反射镜Mo/B-4C多层膜制备及其特性
FABRICATION AND CHARACTERIZATION OF Mo/B 4C MULTILAYER AT WAVELENGTH OF 8 0 nm FOR X RAY LASER
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摘要: 用磁控溅射法制备工作波长约8.0 nm 的 Mo/ B4 C多层膜作为正入射短波长(λ< 10.0 nm )软 X 射线激光反射腔的反射镜。经 X 射线衍射仪和 T E M 检测,多层膜周期结构准确,热稳定性高。Abstract: The Mo/B 4C multilayer at wavelength of 8.0 nm is fabricated by magnetron sputtering. The microstructure of multilayer are tested using X ray diffraction and TEM,and the results show that Mo/B 4C multilayer have high structural quality and thermal stability.