Abstract: The methods of producing boron films on backings by centrifugal precipitation,electrospraying and electricity vibration are presented. Techniques for preparing self supporting B targets between 0 045 and 0 45 mg/cm 2 from isotopic boron by electron bombardment or focused ion beam sputtering are discussed. Microscope slides coated with betaine or Ni plates are used as substrates from which strong B foils with little residual stress are floated. A spectrophotometer has been used to measure the mass thickness of B targets prepared by electron bombardment.