高压电极表面改性及其效果研究

STUDY FOR IMPROVING SURFACE CHARACTERISTICS AND EFFECT OF HIGH VOLTAGE ELECTRODE

  • 摘要: 由半球平板组成的真空间隙,在单次脉冲高压作用下,用数字化信号分析仪 D S A602 A 捕获并理论分析了放电电流波形,计算出一定尺寸真空间隙的半球面阴极顶部轴向电场。用优选的离子束辅助沉积( I B A D)工艺参数,沉积出结合强度很高的一些薄膜。各种薄膜能承受900 ° C的高温处理,经受数百次高能微粒子轰击后,仍能保持原有的表面状况。单次脉冲放电波形的主要参数表明:制作的几种薄膜,在耐压能力方面均有不同程度的改善,改善的程度由薄膜材料的综合特性来体现。

     

    Abstract: The vacuum gap is constituted of hemisphere plane.Under the single pulse high voltage, the discharging current waveform is captured with a digitizing signal analyzer DSA602A and ana lyzed in the theory.The axial electric field of the hemispherical top cathode is calculated in the va cuum gap of the certain size.Some films of high conjunctive intensity can be depositted with the optimal IBAD(ion beam assisted deposition)technological parameters.All films can bear high temperature treatment at 900 ℃,and they can still retain original surface condition after the bom bardment of the high energy microparticles at hundreds of times.The main parameters of single pulse discharging waveform show that the several films have improvement to the different extent about the voltage holding capability, the improvable extent is appeared by synthetic performance of the film material.

     

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