Hydrogenation And Thermal Release of Hydrogen in Titanium Thin Films
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摘要: 用高能离子非卢瑟福背散射分析和前向反冲分析方法研究了C、O污染对Ti膜的吸放氢能力的影响。实验观测到, 1 2 6× 1 0 16cm-2 C和 2 6× 1 0 16cm-2 O的双重污染可使Ti膜在 3 0 0nm的范围内存在着低的H浓度区, 使氢的热释放温度大大提高。表面镀Ni可显著增强Ti膜的吸放氢能力, 使H在Ti膜中均匀地饱和分布, 同时, 将H的热释放温度降到了热力学分解温度附近。Abstract: The carbon and oxygen contamination on Ti surface strongly influences the hydrogen absorption and desorption capability, and even can completely passivate the surface. The effect of C and O on Ti films is investigated by high energy nonrutherford backscattering and elastic recoil detection. The experiment results show that the concentration gradient in the region of about 300 nm near the surface is very large due to the joint contamination of about 1 26×10 16 cm -2 C and 2 5×10 16 cm -2 O, and thermal releasing temperature is also increased greatly. Thin Ni film coated on the Ti film may considerably improve the hydrogen absorption and desorption capability.
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Keywords:
- hydrogenation of Ti ,
- thermal release ,
- ion beam analysis
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