Abstract: The research of laser imprint is an important experiment in inertial confinement fusion(LCF). Thin silicon foil with a thickness of 3～4 μm and surface roughness about 10 nm is prepared by oxidation, diffusion, photoetching process and self-stop etching process. Combined with ion beam etching process, the silicon grating foil with chess board and strip pattern is prepared on the silicon foil. The parameters of diffusion, oxidation, etching process are studied to control the roughness of thin silicon foil. And the parameters of ion beam etching process are studied to control the pattern precision of silicon grating foil._