Preparation of Ag Target for Producing ~(109)Cd by Electro-Deposition

摘要: 采用电沉积法对加速器生产109Cd所用Ag靶的制备工艺进行研究。实验研究了电沉积过程中影响Ag靶层质量及厚度的主要因素,确定了Ag靶制备工艺条件和工艺参数:ρ(Ag+)=20~50 g/L,ρ(KNO3)=10~30 g/L,φ(NH4OH)=0.1~0.2;电流密度10~15 mA/cm2,电沉积时间2~3 h,室温。用此工艺条件制备出靶厚大于100 mg/cm2、表面光滑、镀层致密的Ag靶。

Abstract: The preparation of the Ag target for producing ~(109)Cd by cyclotron using electro-deposition method is described. The effects of main process parameters on the performance and mass thickness of Ag target were studied,and suggested technological conditions are as follows: ρ(Ag~+)=20~50g/L,ρ(KNO_3)=10~30g/L,φ(NH_4OH)=0.1~0.2.By means of it,a well satisfied smooth and firm Ag target with a mass thickness of more than 100mg/cm~2 can be prepared.