Abstract: Using ion implantation technology, the selective surface modification was carried out on Mo-Re alloy films after the irradiation by Xe ions of 200 keV. The different alloy components of these films were analyzed by X-ray fluorescence spectrum (XRF). On the other hand, white-light interferometric profilometer was applied to measure the etching depth and surface roughness of the irradiated area, in order to investigate the relationship between alloy components and irradiation properties. The results show that the addition of Re could improve the anti-sputtering property of the Mo alloy films.