Abstract: Metal vapor vacuum arc ion deposition system was adapted to prepare self-supporting Ni films on substrates of betaine-sucrose/Si, potassium oleate/Si, potassium oleate-sucrose/Si, self-supporting collodion film, polished NaCl and self-supporting SiN film, respectively. Field emission scanning electron microscopy (FESEM) and atomic force microscope (AFM) were employed to analyze the surface morphology and roughness of the films and substrates. The result indicates that the mean roughness of the self-supporting Ni film depends on its depositing substrate. Glancing angle deposition can reduce the surface roughness of film. Self-supporting Ni film with the 1.5 nm mean surface roughness was obtained on self-supporting collodion film with 60° glancing angle.