Abstract:
Surface oxides structure of uraniumniobium alloys which were annealed under different temperatures (room temperature, 100, 200, 300 ℃, respectively) in air were studied by X-ray photoelectron spectroscopy (XPS) analysis and depth profile. Thickness of thermo-oxide layers enhance with the increasing oxide temperature, and obvious changes to oxides structure are observed. Under different delt temperatures, Nb
2O
5 are detected on the initial surface of U-Nb alloys, and a layer of NbO mixed with some NbO
x(0
2O5 and Nb metal. Dealing samples in air from room temperature to 200 ℃, non-stoichiometric UO2+x(UO2 + interstitial oxygen, P-type semiconductor) are found on initial surface of U-Nb alloys, which has 0.7 eV shift to lower binding energy of U 4f7/2 characteristics comparing to that of UO2. Under room temperature, UO2 are commonly detected in the oxides-layer,while under temperature of 100 and 200 ℃, some P-type UO2+x are found in the oxide layers, which has a satellite at binding energy of 396.6 eV. When annealing at 300 ℃, higher valence oxides, such as U3O8 or UOx (2f5/2 and U 4f7/2 peaks are 392.2 and 381.8 eV, respectively. UO2 mixed uranium metal are the main compositions in the oxide layers. From the results, influence of temperature to oxidation of uranium is more visible than to niobium in uranium-niobium alloys.