UO<SUB>2</SUB>薄膜制备和光学常数及厚度测定

UO₂薄膜制备和光学常数及厚度测定

摘要: 利用磁控溅射法制备了UO₂薄膜，通过扫描电子显微镜、X射线光电子能谱仪及X射线衍射仪，对薄膜进行了分析和表征。利用反射光谱法测得了薄膜在400～1 200 nm波长范围内的反射率。通过对反射图谱进行数据拟合，得出UO₂薄膜在450～950 nm波长范围内的折射率为2.1~2.65，消光系数约0.51，厚度为637 nm。

Abstract: Uranium dioxide thin films were prepared by magnetron sputtering method. The films were analyzed and characterized by SEM, XPS and XRD. The reflectances of the films between 400 and 1 200 nm wavelength were measured by reflectance spectroscopy. By fitting the reflectance, the value of refractive index n and extinction coefficient k between 450 and 950 nm wavelength and the films thickness were obtained, the n is in the range of 2.1-2.65, k is nearly 0.51, and the film thickness is 637 nm.