Abstract: The uranium targets were prepared by electro-deposition method. A hydrated uranium dioxide films were electrodeposited into stainless steel plates using uranyl nitrate in ammonium oxalate solution. The results show that the deposition efficiency of the uranium depends on many parameters, such as pH, supporting electrolyte, current density, and cell design. The electro-deposition yield was obtained in thick film samples using ultraviolet-spectrometric analysis of the electrolytic solution before and after the electro-deposition process. The optimized parameters were obtained by investigating the depositing temperature, time, concentration and pH of the supporting electrolyte. Electronic deposit was performed at 60 ℃ with pH＝2-3, current density 60 mA/cm². The effect of UO₂(NO₃)₂ on uranium depositing shows an increase in efficiency as the electrolyte molarity increases at lower electrolyte concentrations, reaches the maximum at 1.67 mg/mL. The uranium films, which are thin, adherent with a yield of 98% at the thickness of near 6 mg/cm² were characterized by infrared spectrum, scanning electron microscope, and X-ray spectrum. Its possible structure composing of uranium target is UO₂(H₂O)₄-O-UO₂(H₂O)₄-O. XPS analysis shows that there is no elements other than uranium (65.35%), oxygen (27.38%), carbon (5.46%) and Pt (1.81%) being detected. The thickness of uranium films would reach 6-8 mg/cm² if repeated plating was adopted after sintering.