氮化镓材料中质子输运过程的模拟

Simulation of Proton Transportation Process in GaN

  • 摘要: 对入射能量为50 keV~3 MeV的质子在氮化镓(GaN)材料中的输运过程进行了Monte-Carlo模拟,得到垂直入射质子在GaN材料中的输运情况、质子与晶格原子作用产生的空位分布特征。模拟结果表明:在厚度固定(3.5 μm)的GaN材料中,当入射能量小于300 keV时,质子束横向扩展明显,入射离子全部被阻止在材料中;随着入射能量增大,质子束横向扩展减弱,离子穿透几率增大,当能量大于500 keV时,入射离子几乎全部从材料中穿出。

     

    Abstract: Proton transportation process was simulated with the energy from 50 keV to 3 MeV in GaN by using Monte-Carlo method. The distributions of incident ions and irradiation induced vacancies were obtained. It is obvious that the proton beams enlarge horizontally when incidence energy is less than 300 keV and all the incidence ions are stopped in the material at 3.5 μm thickness of GaN. The transverse extending of proton beam decreases and the penetration probability increases with incidence energy. Almost all of incidence ions pass through the material when energy is higher than 500 keV. The distribution and defect type induced by different energy of proton are different in the material of GaN.

     

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