Abstract: Scandium films were grown on various substrates (Mo, polished Mo, Si〈111〉) by electron beam deposition at different substrate temperatures. The influence of substrate material and substrate temperature on the microstructure and morphology of Sc films was revealed by the XRD, SEM and AFM results. It is found that the surface of Sc film deposited on polished Mo substrate is rather smooth, and with Stranski-Krastanov growth mode. However, the surface becomes coarse and grows in a Volmer mode when deposited on the rolled Mo substrate. Increasing the substrate temperatures is beneficial to the growth of c-axis orientation of Sc films grown on polished Mo substrate. While, the phase structure of films on Si substrates changes from Sc to the ScSi compound with increasing temperature to 650 ℃, which is harmful to the property of hydrogen absorption.