XPS/AES研究室温下铀基氮化层的表面氧化

罗立力; 刘柯钊; 罗丽珠; 钟永强; 李芳芳; 肖红

doi:10.7538/yzk.2013.47.06.1074

XPS/AES研究室温下铀基氮化层的表面氧化

1.
中国工程物理研究院核物理与化学研究所,四川绵阳621900
2.
表面物理与化学重点实验室,四川绵阳621907

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- 刊出日期: 2013-06-19

Investigation of Surface Oxidation of Nitride Layer on Uranium by In-situ XPS and AES Technique

1.
Institute of Nuclear Physics and Chemistry, China Academy of Engineering Physics, Mianyang 621900, China
2.
Science and Technology on Surface Physics and Chemistry Laboratory, Mianyang 621907, China

摘要

摘要: 采用俄歇电子能谱仪（AES）以及X射线电子能谱仪（XPS）原位研究了室温下铀基氮化层在纯O₂气氛中的初始氧化过程。原位氧化过程中U的AES微分谱以及U 4f、N 1s、O 1s谱的变化显示，U₂N_3+x氧化形成了UN_xO_y；AES深度剖析结果显示，经18 L以及120 L O₂曝露氧化层与氮化层界面处均出现N的富集，表面形成氧化层-富氮层-氮化层的三明治结构。富氮层U原子的AES微分谱中OPV混合峰的峰位远低于氮化层与氧化层，N 1s谱向低能侧移动, 表明富氮层主要成分为N/U比较氮化层更高的氮化物。推测U₂N_3+x的氧化基于O原子对N原子的置换，被置换出的N原子进入邻近晶格使N/U比增大并阻碍O原子向内的进一步扩散。
- AES ,
- XPS ,
- U₂N_3+x
Abstract: The initial oxidation behavior of nitride layer (U₂N_3+x) on uranium metal was investigated by in-situ X-ray photoelectron spectroscopy (XPS) and Auger electron spectroscopy (AES) in oxygen atmosphere at room temperature. AES differential spectrum of uranium and U 4f, N 1s, O 1s spectra all show that UN_xO_y is formed during the oxidation of nitride layer. When exposuring to 18 L and 120 L oxygen it was observed by AES profile measurements that an oxide-nitrogen rich-nitride sandwich structure was formed on the surface of nitride layer. As the OPV mixing peak of nitrogen-rich film is much lower than that of the nitride and oxide layer, and N 1s peak shows the same trend as OPV peak, nitrides with higher N/U ratio may form in the nitrogen-rich layer. It is implied that during the oxidation of uranium sesiquinitride the N atom will be substituted by O atom and move to fill the vacancies of neighbor nitride crystal lattice, which increases the N/U ratio of neighbor field and prevents the O atom’s diffusion.
- AES ,
- XPS ,
- U₂N_3+x

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参考文献(14)

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XPS/AES研究室温下铀基氮化层的表面氧化

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出版历程

Investigation of Surface Oxidation of Nitride Layer on Uranium by In-situ XPS and AES Technique

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出版历程

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