化学沉积103Pd工艺的研究

Study on Electroless 103Pd-plating Process

  • 摘要: 以0.5 mm×3.0 mm碳棒为载体,氯化钯为前体,103Pd为放射性示踪剂,水合肼为还原剂,研究了化学沉积103Pd工艺。结果表明,化学沉积103Pd的优化条件为:2 g/L PdCl2、65 g/L Na2EDTA、700 mL/L 25%NH3•H2O、100 mL/L 5%H4N2•H2O,pH=10,时间90 min,温度50 ℃。化学沉积103Pd溶液稳定性好,反应易进行;有95%的103Pd沉积到载体棒上,碳棒对103Pd的吸收仅约为12%,103Pd利用率高;沉积层呈灰白色,表面平整;化学沉积103Pd批内均匀性好,重复性好。化学沉积103Pd技术可用于制备103Pd粒子和新型103Pd-125I复合粒子。

     

    Abstract: Using 0.5 mm×3.0 mm carbon rod as substrate, PdCl2 as precursor, 103Pd as radioactive tracer, and hydrazine as reductant, the process of electroless 103Pd-plating was studied. The results show that the optimum conditions of electroless 103Pd-plating are 2 g/L PdCl2, 65 g/L Na2EDTA, 700 mL/L 25%NH3•H2O, 100 mL/L 5%H4N2•H2O, pH=10, t=90 min, and the temperature of 50 ℃. The solution has good stability. The electroless 103Pd-plating is easy to carry out. About 95% 103Pd is deposited and 12% activity is shielded by the carbon rod. The utilization rate of 103Pd in the chemical adsorption reaction is high. 103Pd-coating is grey and smooth. 103Pd-coating on each substrate of carbon rod is uniform, and the reaction can be repeated well. The technology of electroless 103Pd-plating can be applied in preparation of 103Pd seed and 103Pd-125I hybrid seed which is a new member of brachytherapy.

     

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