Abstract: The Al coating with fine performance on V-alloy surface is an important foundation for the fabrication of V-Al/Al₂O₃ as tritium permeation barrier. In present work, the anodic behavior of V-5Cr-5Ti（a candidate structural material of fusion reactor） in AlCl₃-EMIC (with molar ratio of 2∶1) ionic liquid was studied by electrochemical analysis. The influences of different potentials and time on anodic etching of V-5Cr-5Ti were investigated by potentiostatically anodic polarization. And on this basis, the effects of anodic potential, deposition time and temperature on Al coatings were studied under constant current density (16 mA/cm²). The results show that the anodic oxidation current reaches maximum when anodic potential is 1.25 V, and the uniform and reproducible surface of V-5Cr-5Ti is obtained by etching with this potential for 15 min. With the current density of 16 mA/cm², the coatings are pure Al with preferred orientation of (111) and (200), and well adhesion. A compact and integral Al coating with thickness of 20 μm can be obtained after 75 min at 16 mA/cm² under room temperature.