Abstract: In order to prevent the corrosion of metallic uranium, nickel films were prepared on uranium by laser assisted chemical vapor deposition (LACVD) and characterized by SEM, XRD, gluing pull experiment, and electrochemical polarization. The results show that the pressure of Ni(CO)₄ and temperature of substrates have much influence on the quality of nickel films. When the temperature and pressure descend, the films by chemical vapor deposition (CVD) become compact and planar, the quality of the films gets better, and at 165 ℃ and 3 Pa the films show small grain size and high density. By LACVD with 200 mJ pulse energy, films show compact microstructures, and with 300 mJ pulse energy, films become rough. Without laser assistance (CVD) films are easily peeled off from substrate, while the LACVD nickel films show good adhesion. The electrochemical experiments show that uranium with laser CVD nickel films has excellent corrosion resistance. The microscopic analysis shows that corrosion resistance improvement stems from the film density increase and good adhesion of the nickel films and uranium substrate.