用于双离子束注入器的杂质消除系统

Study on Impurity Elimination System for Dual-beam Accelerator

摘要: 研制了一套用于双离子束注入器的杂质消除系统，该系统由两台速度选择器、1台单透镜和1台双孔选束光阑组成，可实现不同荷质比的两种离子束在同时传输过程中消除杂质离子。该技术已用于1台H⁺₂和He⁺两种离子束同时传输的50 keV双离子束注入器，实现了1台加速器同时产生、传输两种离子束，并同轴注入靶内，离子束纯度好于99.9%。

Abstract: A set of impurity elimination system for dual-beam accelerator was developed. This system consists of two Wien filters, one Einzel lens and a slit with two apertures. The two ion beams with different mass-to-charge ratios can be generated in the same ion source and transported in the same beam line simultaneously without impurity. The impurity ions can be eliminated by the slit after the first Wien filter. The beams of H⁺₂and He⁺can be produced simultaneously and injected into the target coaxially. The purity of the ion beam on the target is better than 99.9%.