氚深度分布对β射线诱发X射线光谱法测量能谱中Ar(Kα)强度的影响

Effect of Depth Profile on Ar(Kα) Intensity of β-ray Induced X-ray Spectroscopy Spectrum in Tritium Measurement

  • 摘要: BIXS(β射线诱发X射线光谱法)是一种针对材料中氚的无损测量方法,该方法通过探测氚在材料与工作气体(氩气)中诱发的特征X射线与轫致辐射X射线谱计算材料表层(β射线射程范围内)与基体中的氚含量与分布。通常认为氩的Kα特征峰强度与材料表层氚含量呈正比,然而该结论的前提是氚在材料表层均匀分布,而未考虑非均匀分布的情形。本文详细评估了氚在材料表层的深度分布对BIXS能谱中Ar(Kα)强度的影响,结果表明,在均匀分布的情况下,β射线最大射程的1/10范围内的氚对Ar(Kα)强度的贡献约为50%;在非均匀分布的情况下,Ar(Kα)的强度与均匀分布有数倍的差异。因此在实际测量中需根据氚在材料表层的具体分布对结果进行修正。

     

    Abstract: β-ray induced X-ray spectroscopy (BIXS) is a nondestructive measurement method for tritium in materials. It calculates the content and distribution of tritium in the surface layer (βray range) and bulk by detecting the characteristic Xray and bremsstrahlung Xray spectra induced by tritium in the material and working gas (argon). It is generally believed that the intensity of Ar(Kα) is directly proportional to the tritium content in the surface layer. However, this conclusion is based on the premise that the tritium is uniformly distributed in the surface layer without considering the nonuniform distribution. The influence of the depth profile of tritium on the Ar(Kα) intensity in BIXS spectrum was evaluated in detail. The results show that the contribution of tritium to Ar(Kα) intensity in 1/10 of the maximum range of βrays is about 50% under the condition of uniform distribution. The intensity of Ar(Kα) is several times different from that of uniform distribution under nonuniform distribution. Therefore, in the actual measurement, the results should be modified according to the specific distribution of tritium in the material surface.

     

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