Abstract: Substrate coating is an important process in the preparation of deuterium/tritium target. The performance of target film directly affects deuterium charging and neutron experiments. The uniformity of film thickness, film adhesion and impurity elements will affect the amount of deuterium in the process of deuterium/tritium charging, and even losing efficacy of the target. Magnetron sputtering coating is benefit to the film coating with high compactness and adhesion, which is suitable for deuterium/tritium target coating process. In this paper, coating was carried out through magnetron sputtering after removing grease, dirt and oxide layer of the targets. The coating of dense film, transition film and functional film were realized by changing the power density of the vacuum coating machine. The coating thickness was determined by changing the coating time. The target film for high current deuterium and tritium neutron source with uniform film thickness and high binding force was developed. The size range of coated substrate was 15 mm to 500 mm. The theoretical coating thickness was measured by weighing method through electronic balance. The micro morphology of the film was observed by scanning electron microscope, so as to measure the actual thickness of the film. The adhesion of the film was analyzed by scratch tester. The content of impurity elements in the film was analyzed by electron microprobe to characterize the performance of the target film. The scanning electron microscope results show that the particle size of the film is fine and evenly distributed, and the particle size is in the range of 0.19 μm to 0.93 μm. The actual film thickness measured by electron microscope is basically consistent with the theoretical film thickness measured by electronic scale, indicating that the coating has high compactness. The results of electron microprobe show that the impurity elements on the surface of the film are C, O and Fe. The total content of impurity elements is less than 6.0%. 200 mm and 500 mm substrates were coated and the theoretical film thicknesses were analyzed. The film thickness error at different positions of the same substrate is less than ±5%, showing that the film thickness is uniform at all points of the film layer. The activation deuterium charging experiment was carried out on the coated substrate. The results show that the deuterium/titanium (atomic ratio) reaches up to 1.98. The phenomenon of falling off the film in the process of deuterium charging does not occur, which meet the requirements of neutron experiment. Subsequent neutron experiments can be carried out.