CaF2:Mn(TLD-400)热压片的高剂量响应特性

High Dose Response Characteristics of Hot-pressed CaF2:Mn (TLD-400) Chip

  • 摘要: 利用60Co γ辐照装置研究了CaF2:Mn(TLD-400)热压片在高剂量水平的热释光响应性能,获得了CaF2:Mn热压片高剂量响应新曲线。研究结果表明:发光曲线由一个复合峰构成,复合峰形状与辐照剂量密切相关;采用动态布点和慢加热速率获得了1~3 500 Gy范围高精度剂量响应曲线,由γ响应灵敏度相差近5倍的两段线性区域(1~500 Gy、500~2 200 Gy)和一段饱和区域(2 200~3 500 Gy)构成,响应饱和前未出现亚线性或超线性响应区域,此响应特点未见相关报道;饱和剂量阈值为2 200 Gy,小于厂商标称测量上限2 600 Gy;CaF2:Mn热压片受到饱和剂量辐照后发光强度下降3%~9%,高温退火无法恢复其性能,表明γ辐照损伤已出现,损伤剂量阈值约3 000 Gy。本文研究结果为γ总剂量效应模拟实验中电子器件辐射剂量测量提供了重要参考。

     

    Abstract: The thermoluminescence (TL) response characteristics of hot-pressed CaF2:Mn (TLD-400) chip at high dose level were experimentally studied by using 60Co isotope sources, and the high dose response curve of CaF2:Mn chip was obtained to meet the requirements for determining absorbed dose in the radiation-hardness test of electronic device. Irradiation experiment was performed on two sets of 60Co gamma irradiation facilities delivering the dose rate with 21.38 Gy/h and 945.5 Gy/h in State Key Laboratory of Intense Pulsed Radiation Simulation and Effect (SKLIPR) of Northwest Institute of Nuclear Technology (NINT). A 0.6 cm3 ionization chamber traced was used to measure the dose rate of gamma irradiation field. The study result shows that the typical TL glow curve of CaF2:Mn chip at high dose level is a composite of several overlapped components, with maximum intensity appearing around 260 ℃. The actual shape of TL composite peak depends on the irradiation dose. Using the dynamic distribution points, the high dose response curve with high accuracy in the range of 1-3 500 Gy under slow heating rate was presented, which consists of two linear regions (1-500 Gy, 500-2 200 Gy) and one saturated region (2 200-3 500 Gy). In the range of 1-500 Gy and 500-2 200 Gy, the TL response increases linearly with irradiation dose, and the linear correlation coefficients (R2) are better than 0.99. But there is a great difference as large as nearly five times in the two slopes of linear range. Besides, the TL response increases no longer with increasing irradiation dose in the range of 2 200-3 500 Gy, and the saturated threshold is 2 200 Gy, which is far below the manufacturer’s nominal upper limit of 2 600 Gy. Moreover, there is no sublinear region or superlinear region before saturation, which is different from the literatures reported. The TL response per Gy increases considerably, reaching its maximum at 400 Gy, and then decreases with increasing dose. The uniformity and reproducibility of CaF2:Mn chip TL response were further evaluated. The standard deviation of 30 random thermoluminescence dosimeters (TLDs) irradiated at 50 Gy and ten repeated measurements in the identical condition at 1 000 Gy are 3.8% and 0.47%, respectively. The TL intensity of the chip stored in darkness at room temperature declines within 1% in two weeks and 4% in three weeks, respectively, which indicates that CaF2:Mn chip has excellent storage stability. After being irradiated at a saturated dose of 3 000 Gy, the TL intensity of the chip in the dose range of 500-2 000 Gy decreases by 3%-9% compared with that before saturation, and the response performance fails to restore by thermal annealing, which implies the onset of gamma radiation damage and the damage dose of about 3 000 Gy. The result provides a new reference for the application of CaF2:Mn phosphor in measuring absorbed dose of electronic device in radiation-hardness test.

     

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