22 nm FDSOI工艺触发器电路单粒子翻转的温度-电压协同影响研究

Impact of Temperature and Supply Voltage on Single Event Upset Characterization of Flip-flop in a 22 nm FDSOI Technology

  • 摘要: 温度和电源电压是全耗尽绝缘体上硅(FDSOI)工艺电路单粒子翻转响应的关键影响因素,二者的协同作用需深入分析。本文通过高能重离子试验,获取了不同电源电压测试条件下,22 nm FDSOI工艺触发器电路单粒子翻转截面随温度的变化规律。等效线性能量传输(LET)值为75.4 MeV·cm2/mg的Ta粒子试验结果表明,当温度由27 ℃升高至125 ℃,触发器的单粒子翻转截面在两种电源电压条件下均显著增加,且在较低电源电压条件下,单粒子翻转截面与温度的相关性更大。通过TCAD仿真,研究了温度-电压的协同作用机制。相较于饱和电流,辐射诱导的电荷收集量主导了温度和电源电压协同影响结果。本文研究为纳米FDSOI工艺集成电路在温度和电压作用下的辐射响应评估和加固设计提供依据。

     

    Abstract: Temperature and supply voltage emerge as critical factors influencing single event upset (SEU) responses in nano-scale fully depleted silicon-on-insulator (FDSOI) technology. This paper conducted heavy ion radiation experiments on 22 nm FDSOI flip-flop circuit to obtain SEU cross section with temperature and supply voltage variations. Furthermore, TCAD simulations were also performed to study the single event effect (SEE) mechanisms of FDSOI device. To accurately capture the intrinsic SEU cross section data of FDSOI technology, commercial 22 nm FDSOI flip-flop was selected as the test sample. Based on HIRFL accelerator at the Institute of Modern Physics, Chinese Academy of Sciences, Ta ion (LET is 75.4 MeV·cm2/mg) was selected for the radiation experiments. Two temperature points (27 ℃ and 125 ℃) and two supply voltages (0.72 V and 0.88 V) were chosen to obtain the synergistic effect of temperature and supply voltage on SEU. Experimental results show that SEU cross section at high temperature increases by 40% compared to room temperature for 0.72 V supply voltage, while the value increases by 7% for the supply voltage of 0.88 V. The data demonstrates that the cross section increases with rising temperature at both low and high supply voltages. Moreover, the change in cross section at 0.72 V is 5.7 times higher than that at 0.88 V, which indicates that the temperature dependence of cross section is more pronounced at lower voltage. This difference can be fundamentally attributed to the combined effects of temperature and supply voltage on the charge collection (CC) mechanisms of the FDSOI device. To clarify the temperature and supply voltage dependence of cross section in flip-flop, 3D TCAD simulations were conducted, focusing on CC and saturation current (I_SAT) under different temperature and supply voltage conditions. Initial TCAD models of NMOS and PMOS were established and the electrical characteristic curves exhibited close agreement with SPICE models. Simulation results show that CC is increased as temperature is raised from 27 ℃ to 125 ℃, confirming a positive correlation between CC and temperature. While the recovery capability is also improved at higher temperature, exerting opposing effects on SEE sensitivity compared with CC. Simulations reveal that the change in CC with temperature elevation, rather than I_SAT, dominates the temperature and supply voltage dependence of SEU sensitivity. It is further demonstrated that for the same temperature range (27 ℃ to 125 ℃), reducing the supply voltage enhances the temperature-induced change in CC. The results address the synergistic effect of temperature and supply voltage on SEE susceptibility in nano-scale FDSOI circuits, it is also meaningful to SEE evaluation in dynamic supply voltage or temperature operating conditions and SEE hardened design requirements.

     

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