Abstract: Ion sources are critical components of accelerators, directly determining their performance limits and application scope. In recent years, the demand for ion beams in material irradiation research has grown substantially, driven by advances in semiconductor manufacturing, materials science, and nuclear physics. Specifically, neutron irradiation simulation using ions requires both light gaseous ions (e.g., H⁺, He⁺) to reproduce transmutation effects and heavy solid ions (e.g., Fe⁺) to induce displacement damage. Similarly, ion implantation for material modification often involves sequential or co-implantation of gaseous and solid-state ions to achieve multi-element alloying. These diverse requirements demand ion sources capable of generating both gaseous and solid-state ion beams with high efficiency and fast switching capability. This study aimed to develop a versatile ion source that can generate ion beams from both gaseous and solid elements within a single compact discharge chamber, enabling in-situ, rapid switching between operation modes without breaking vacuum or replacing hardware. The ion source was based on a hot-cathode arc discharge configuration. A multi-cusp magnetic field was arranged around the discharge chamber to confine electrons and enhance ionization efficiency. An integrated plasma electrode, which can be independently biased, was placed inside the discharge chamber. In gas ionization mode, the injected gas was ionized by electron impact. In sputtering mode, a negative bias applied to the plasma electrode accelerates positive ions from the auxiliary gas (Ar or Kr) to 500 eV, which then sputter solid atoms from the target mounted on the electrode. These sputtered atoms were subsequently ionized in the plasma. Switching between the two modes was achieved simply by adjusting the electrode potential, requiring no hardware changes or vacuum venting. The ion source has been successfully installed and operated on a 400 kV ion implanter at Harbin Institute of Technology. In gas mode, it has produced H⁺, He⁺, Ar⁺, and Kr⁺ ion beams. Under an Ar gas flow rate of 0.16 sccm, an extracted Ar⁺ beam current of 2.8 mA was achieved, corresponding to an ionization efficiency of approximately 25%. In sputtering mode, using a 304 stainless steel target, an analyzed Fe⁺ beam current of 50 μA was obtained. This ion source represents the first demonstration of in-situ, electrical switching between gaseous and solid-state ion beam generation in a single compact discharge chamber. It offers milliampere-level gaseous ion beams and tens-of-microampere-level metal ion beams, providing an efficient and flexible solution for multi-element, multi-phase ion beam applications. The source is particularly suitable for sequential irradiation experiments requiring alternating gaseous and solid ions, such as H/He and Fe co-irradiation studies for nuclear materials.